Figure 2
From: An integrated approach for the in vitro dosimetry of engineered nanomaterials
Validation of dosimetry methodology for two metal oxide ENMs. a. Validation of dosimetry approach for CeO2 (dXRD=28.4 nm) suspended in DMEM; b. Validation of dosimetry approach for SiO2 coated CeO2 (dXRD=28.4 nm) suspended in DMEM. All experiments were done in triplicate, error bars represent standard deviation.