Nanomaterial | Manufacturer | Manufacturing process | Theoretical aSiO2 (wt%) | TCT (nm) | dXRD (nm) | dBET (nm) | SSA (m2/g) |
---|
nCeO2
| Harvard University | VENGES FSP | 0 | 0 | 17.3 | 12.8 | 61 |
amsCeO2
| Harvard University | VENGES FSP | 20 | 3 | 21 | 19.2 | 50 |
aSiO2
| Harvard University | VENGES FSP | 100 | n/d | n/d | 14 | 195 |
Sigma CeO2
| Sigma-Aldrich | n/d | 0 | n/d | n/d | 20 | n/d |
SWCNT | CNI Houston | HipCo | 0 | n/d | n/d | n/d | 400 – 1200 |
- Abbreviations: nCeO
2
uncoated nCeO2, amsCeO
2
amorphous SiO2-coated nCeO2, aSiO
2
amorphous SiO2, n/d measurement not determined or data not available, VENGES FSP versatile engineered nanomaterial generation system flame spray pyrolysis, HipCo high pressure CO disproportionation, TCT theoretical coating thickness, d
XRD
x-ray diffraction calculated diameter, d
BET
Brunauer–Emmett–Teller calculated primary particle diameter, SSA specific surface area