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Table 1 Physical-chemical characterization of CeO2, SiO2 and CuO particles

From: Metabolomic effects of CeO2, SiO2 and CuO metal oxide nanomaterials on HepG2 cells

ID Chemical Vendor Cat No. Lot number Primary particle size (nm) TEM particle size (nm) SEM aggregate Size (um) Surface area (m2/g) Diameter by BET (nm) FTIR Elements by SEM-EDX Elements by TEM-EDX Form by XRD Assayer
CeO2 W4 CeO2 Nano-oxides 10-025 68740 15 by BET    55 15      Nano-oxides
  20–50 1–3 52.8 14.9 -OH, Ce-O Ce, O, Al Ce, O, Al, Ti, Si crystalline University of Kentucky
CeO2 X5 CeO2 Nano-oxides 10-025-3 67722 200 by BET    5–9 200      Nano-oxides
  5–20 1–5 20.8 38.1 -OH, Ce-O Ce, O Ce, O crystalline University of Kentucky
CeO2 Y6 CeO2 Aldrich 544841 67722 <25 by BET          Aldrich
  5–20 1–20 40.3 19.5 -OH, Ce-O Ce, O Ce, O crystalline University of Kentucky
CeO2 Z7 CeO2 Alfa aesar 44960 J06 U027 15–30    30–50       Alfa aesar
  5–20 1–5 57.0 13.8 -OH, Ce-O Ce, O Ce, O crystalline University of Kentucky
CeO2 Q CeO2 Sigma Aldrich 211575 NM-213 <5000 >500 0.615 3.73 213      Geraets et al. [26]
  NDa ND ND ND ND ND ND ND University of Kentucky
SiO2 J0 SiO2 US Research Nanomaterials US3438 None 20–30          US Research Nanomaterials
  10–30 1–10 137.4 16.5 -OH, Si-O Si, O Si, O amorphorus University of Kentucky
SiO2 K1 SiO2 ALDb NAc None 20–30          US Research Nanomaterials
  10–30 1–10 128.8 17.6 -OH, Si-O Si, O Si, O amorphorus University of Kentucky
SiO2 N2 SiO2 ALDb NAc None 20–30          US Research Nanomaterials
  10–30 1–10 120.5 18.8 -OH, Si-O Si, O Si, O amorphorus University of Kentucky
CuO CuO Nanostruct-ured and Amorphous Materials 2110FY US3438 47          Nanostructured and Amorphous Materials
  20–80 1–3 10.8 88. -OH Cu, O Cu, O crystalline University of Kentucky
  1. Abbreviations: TEM transmission electron microscopy, SEM scanning electron microscopy, BET surface area/porosity determination by the Brunauer, Emmett, Teller test method, FTIR Fourier transform infrared spectroscopy, EDX energy-dispersive x-ray analysis, XRD X-ray diffraction
  2. aNot done
  3. bAtomic layer deposition on SiO2
  4. cNot available